(6) Cleaning of silicon wafer (slicing process)

Aim of EUTEC installation	Separation of cleaner from rinsing fluid
Expected benefits of EUTEC installation	Prolong service life of cleaning fluid and prevent re-attachment of oil to silicon wafer
Cleaning target	Silicon wafer
Type of dirt/contaminant	Cutting oil/fluid
Type of cleaner being used	Semi-aqueous cleaner
Operating temperature of cleaner	60℃
Model of oil-water separator used (process flow rate)	TH-30 (5L/min)

*Click here for more examples of cleaning-related installation flows.